APA (7th ed.) Citation

Yin, L., & Chou, J. (2001). Characteristics of Silicon Nitride after O[sub 2] Plasma Surface Treatment for pH-ISFET applications. IEEE Transactions on Biomedical Engineering, 48(3), 340. https://doi.org/10.1109/10.914797

Chicago Style (17th ed.) Citation

Yin, Li-Te, and Jung-Chuan Chou. "Characteristics of Silicon Nitride After O[sub 2] Plasma Surface Treatment for PH-ISFET Applications." IEEE Transactions on Biomedical Engineering 48, no. 3 (2001): 340. https://doi.org/10.1109/10.914797.

MLA (9th ed.) Citation

Yin, Li-Te, and Jung-Chuan Chou. "Characteristics of Silicon Nitride After O[sub 2] Plasma Surface Treatment for PH-ISFET Applications." IEEE Transactions on Biomedical Engineering, vol. 48, no. 3, 2001, p. 340, https://doi.org/10.1109/10.914797.