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Characteristics of Silicon Nitride after O[sub 2] Plasma Surface Treatment for pH-ISFET applications.

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Title: Characteristics of Silicon Nitride after O[sub 2] Plasma Surface Treatment for pH-ISFET applications.
Authors: Li-Te Yin, Jung-Chuan Chou
Source: IEEE Transactions on Biomedical Engineering. Mar2001, Vol. 48 Issue 3, p340. 5p. 5 Black and White Photographs, 2 Diagrams, 4 Charts, 4 Graphs.
Subjects: Plasma gases, Silicon nitride, Field-effect transistors, Hydrogen-ion concentration
Abstract: Provides information on a study which determined the characteristics of silicon nitride after oxygen plasma surface treatment for potential of hydrogen ions-selective field effect transistors applications. Experimental methods; Results and discussions; Conclusion.
Database: Engineering Source
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  Availability: 0
Header DbId: egs
DbLabel: Engineering Source
An: 4303879
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
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  Data: Characteristics of Silicon Nitride after O[sub 2] Plasma Surface Treatment for pH-ISFET applications.
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  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Li-Te+Yin%22">Li-Te Yin</searchLink><br /><searchLink fieldCode="AR" term="%22Jung-Chuan+Chou%22">Jung-Chuan Chou</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22IEEE+Transactions+on+Biomedical+Engineering%22">IEEE Transactions on Biomedical Engineering</searchLink>. Mar2001, Vol. 48 Issue 3, p340. 5p. 5 Black and White Photographs, 2 Diagrams, 4 Charts, 4 Graphs.
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  Data: <searchLink fieldCode="DE" term="%22Plasma+gases%22">Plasma gases</searchLink><br /><searchLink fieldCode="DE" term="%22Silicon+nitride%22">Silicon nitride</searchLink><br /><searchLink fieldCode="DE" term="%22Field-effect+transistors%22">Field-effect transistors</searchLink><br /><searchLink fieldCode="DE" term="%22Hydrogen-ion+concentration%22">Hydrogen-ion concentration</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Provides information on a study which determined the characteristics of silicon nitride after oxygen plasma surface treatment for potential of hydrogen ions-selective field effect transistors applications. Experimental methods; Results and discussions; Conclusion.
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=egs&AN=4303879
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1109/10.914797
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      – Code: eng
        Text: English
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        PageCount: 5
        StartPage: 340
    Subjects:
      – SubjectFull: Plasma gases
        Type: general
      – SubjectFull: Silicon nitride
        Type: general
      – SubjectFull: Field-effect transistors
        Type: general
      – SubjectFull: Hydrogen-ion concentration
        Type: general
    Titles:
      – TitleFull: Characteristics of Silicon Nitride after O[sub 2] Plasma Surface Treatment for pH-ISFET applications.
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            NameFull: Li-Te Yin
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            NameFull: Jung-Chuan Chou
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            – D: 01
              M: 03
              Text: Mar2001
              Type: published
              Y: 2001
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              Value: 00189294
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              Value: 48
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              Value: 3
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            – TitleFull: IEEE Transactions on Biomedical Engineering
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