Characteristics of Silicon Nitride after O[sub 2] Plasma Surface Treatment for pH-ISFET applications.
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| Title: | Characteristics of Silicon Nitride after O[sub 2] Plasma Surface Treatment for pH-ISFET applications. |
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| Authors: | Li-Te Yin, Jung-Chuan Chou |
| Source: | IEEE Transactions on Biomedical Engineering. Mar2001, Vol. 48 Issue 3, p340. 5p. 5 Black and White Photographs, 2 Diagrams, 4 Charts, 4 Graphs. |
| Subjects: | Plasma gases, Silicon nitride, Field-effect transistors, Hydrogen-ion concentration |
| Abstract: | Provides information on a study which determined the characteristics of silicon nitride after oxygen plasma surface treatment for potential of hydrogen ions-selective field effect transistors applications. Experimental methods; Results and discussions; Conclusion. |
| Database: | Engineering Source |
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