Monitoring plasma conditions.
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| Title: | Monitoring plasma conditions. |
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| Authors: | Kim, Byungwhan, Choi, Wookyung |
| Source: | Solid State Technology. Nov2001, Vol. 44 Issue 11, p73. 5p. 1 Diagram, 6 Graphs. |
| Subjects: | Plasma gases, Machine tool monitoring, Manufacturing processes |
| Abstract: | Examines an alternative method for monitoring the condition of plasma in the etch and deposition wafer processing. Importance of plasma monitoring; Acquisition of experimental data; Basic theory of discrete wavelet. |
| Database: | Engineering Source |
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