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Deposition of Dense Siloxane Monolayers from Water and Trimethoxyorganosilane Vapor.

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Title: Deposition of Dense Siloxane Monolayers from Water and Trimethoxyorganosilane Vapor.
Authors: Randall D. Lowe1, Matthew A. Pellow1, T. Daniel P. Stack1, Christopher E. D. Chidsey1
Source: Langmuir. Aug2011, Vol. 27 Issue 16, p9928-9935. 8p.
Subjects: Vapor-plating, Siloxanes, Monomolecular films, Water, Organosilicon compounds, Temperature effect, Fourier transform infrared spectroscopy, Electric capacity
Abstract: A convenient, laboratory-scale method for the vapor deposition of dense siloxane monolayers onto oxide substrates was demonstrated. This method was studied and optimized at 110 °C under reduced pressure with the vapor of tetradecyltris(deuteromethoxy)silane, (CD3O)3Si(CH2)13CH3, and water from the dehydration of MgSO4·7H2O. Ellipsometric thicknesses, water contact angles, Fourier transform infrared (FTIR) spectroscopy, and electrochemical capacitance measurements were used to probe monolayer densification. The CD3stretching mode in the FTIR spectrum was monitored as a function of the deposition time and amounts of silane and water reactants. This method probed the unhydrolyzed methoxy groups on adsorbed silanes. Excess silane and water were necessary to achieve dense, completely hydrolyzed monolayers. In the presence of sufficient silane, an excess of water above the calculated stoichiometric amount was necessary to hydrolyze all methoxy groups and achieve dense monolayers. The excess water was partially attributed to the reversibility of the hydrolysis of the methoxy groups. [ABSTRACT FROM AUTHOR]
Copyright of Langmuir is the property of American Chemical Society and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Deposition of Dense Siloxane Monolayers from Water and Trimethoxyorganosilane Vapor.
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  Data: <searchLink fieldCode="JN" term="%22Langmuir%22">Langmuir</searchLink>. Aug2011, Vol. 27 Issue 16, p9928-9935. 8p.
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  Data: <searchLink fieldCode="DE" term="%22Vapor-plating%22">Vapor-plating</searchLink><br /><searchLink fieldCode="DE" term="%22Siloxanes%22">Siloxanes</searchLink><br /><searchLink fieldCode="DE" term="%22Monomolecular+films%22">Monomolecular films</searchLink><br /><searchLink fieldCode="DE" term="%22Water%22">Water</searchLink><br /><searchLink fieldCode="DE" term="%22Organosilicon+compounds%22">Organosilicon compounds</searchLink><br /><searchLink fieldCode="DE" term="%22Temperature+effect%22">Temperature effect</searchLink><br /><searchLink fieldCode="DE" term="%22Fourier+transform+infrared+spectroscopy%22">Fourier transform infrared spectroscopy</searchLink><br /><searchLink fieldCode="DE" term="%22Electric+capacity%22">Electric capacity</searchLink>
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  Data: A convenient, laboratory-scale method for the vapor deposition of dense siloxane monolayers onto oxide substrates was demonstrated. This method was studied and optimized at 110 °C under reduced pressure with the vapor of tetradecyltris(deuteromethoxy)silane, (CD3O)3Si(CH2)13CH3, and water from the dehydration of MgSO4·7H2O. Ellipsometric thicknesses, water contact angles, Fourier transform infrared (FTIR) spectroscopy, and electrochemical capacitance measurements were used to probe monolayer densification. The CD3stretching mode in the FTIR spectrum was monitored as a function of the deposition time and amounts of silane and water reactants. This method probed the unhydrolyzed methoxy groups on adsorbed silanes. Excess silane and water were necessary to achieve dense, completely hydrolyzed monolayers. In the presence of sufficient silane, an excess of water above the calculated stoichiometric amount was necessary to hydrolyze all methoxy groups and achieve dense monolayers. The excess water was partially attributed to the reversibility of the hydrolysis of the methoxy groups. [ABSTRACT FROM AUTHOR]
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  Data: <i>Copyright of Langmuir is the property of American Chemical Society and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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        Value: 10.1021/la201333y
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      – Code: eng
        Text: English
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        PageCount: 8
        StartPage: 9928
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      – SubjectFull: Vapor-plating
        Type: general
      – SubjectFull: Siloxanes
        Type: general
      – SubjectFull: Monomolecular films
        Type: general
      – SubjectFull: Water
        Type: general
      – SubjectFull: Organosilicon compounds
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      – SubjectFull: Temperature effect
        Type: general
      – SubjectFull: Fourier transform infrared spectroscopy
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      – SubjectFull: Electric capacity
        Type: general
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      – TitleFull: Deposition of Dense Siloxane Monolayers from Water and Trimethoxyorganosilane Vapor.
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              Text: Aug2011
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              Y: 2011
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