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Polymer as the protecting passivaton layer in fabricating suspended SCS structures in both anisotropic and isotropic etching.

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Title: Polymer as the protecting passivaton layer in fabricating suspended SCS structures in both anisotropic and isotropic etching.
Authors: Yu-Hsin Lin1,2, Wensyang Hsu1 whsu@mail.nctu.edu.tw
Source: Journal of Micromechanics & Microengineering. Apr2012, Vol. 22 Issue 4, p1-10. 10p.
Subjects: Polymers, Anisotropy, Micromachining, Microstructure, Single crystals, Crystal structure, Parameter estimation
Abstract: This paper presents a rapid bulk micromachining process named polymer passivation layer for suspended structures etching by using a polymer as a protecting passivation layer at both anisotropic and isotropic etching steps. Without using silicon-dioxide (SiO2) deposition or boron doping as a protection layer at the releasing step, the proposed method can fabricate suspended single-crystal silicon structures in an inductively coupled plasma reactive ion etching chamber directly, which would simplify the fabrication process and save fabrication time. The current study systematically investigates critical fabrication parameters to verify the feasibility of the proposed method, and discusses the polymer passivation time and removal time of a polymer at the base of a substrate at four different opening gaps of 5, 10, 30 and 50 µm with the 30 µm deep trench to establish suitable recipes for fabricating suspended microstructures. It is also shown that the proposed method can fabricate not only the suspended microstructures with the same thickness, but also suspended microstructures with different thicknesses, as well as in sub-micro scale. [ABSTRACT FROM AUTHOR]
Copyright of Journal of Micromechanics & Microengineering is the property of IOP Publishing and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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DbLabel: Engineering Source
An: 73497480
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Polymer as the protecting passivaton layer in fabricating suspended SCS structures in both anisotropic and isotropic etching.
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  Data: <searchLink fieldCode="AR" term="%22Yu-Hsin+Lin%22">Yu-Hsin Lin</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AR" term="%22Wensyang+Hsu%22">Wensyang Hsu</searchLink><relatesTo>1</relatesTo><i> whsu@mail.nctu.edu.tw</i>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Micromechanics+%26+Microengineering%22">Journal of Micromechanics & Microengineering</searchLink>. Apr2012, Vol. 22 Issue 4, p1-10. 10p.
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  Data: <searchLink fieldCode="DE" term="%22Polymers%22">Polymers</searchLink><br /><searchLink fieldCode="DE" term="%22Anisotropy%22">Anisotropy</searchLink><br /><searchLink fieldCode="DE" term="%22Micromachining%22">Micromachining</searchLink><br /><searchLink fieldCode="DE" term="%22Microstructure%22">Microstructure</searchLink><br /><searchLink fieldCode="DE" term="%22Single+crystals%22">Single crystals</searchLink><br /><searchLink fieldCode="DE" term="%22Crystal+structure%22">Crystal structure</searchLink><br /><searchLink fieldCode="DE" term="%22Parameter+estimation%22">Parameter estimation</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: This paper presents a rapid bulk micromachining process named polymer passivation layer for suspended structures etching by using a polymer as a protecting passivation layer at both anisotropic and isotropic etching steps. Without using silicon-dioxide (SiO2) deposition or boron doping as a protection layer at the releasing step, the proposed method can fabricate suspended single-crystal silicon structures in an inductively coupled plasma reactive ion etching chamber directly, which would simplify the fabrication process and save fabrication time. The current study systematically investigates critical fabrication parameters to verify the feasibility of the proposed method, and discusses the polymer passivation time and removal time of a polymer at the base of a substrate at four different opening gaps of 5, 10, 30 and 50 µm with the 30 µm deep trench to establish suitable recipes for fabricating suspended microstructures. It is also shown that the proposed method can fabricate not only the suspended microstructures with the same thickness, but also suspended microstructures with different thicknesses, as well as in sub-micro scale. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Journal of Micromechanics & Microengineering is the property of IOP Publishing and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1088/0960-1317/22/4/045015
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 10
        StartPage: 1
    Subjects:
      – SubjectFull: Polymers
        Type: general
      – SubjectFull: Anisotropy
        Type: general
      – SubjectFull: Micromachining
        Type: general
      – SubjectFull: Microstructure
        Type: general
      – SubjectFull: Single crystals
        Type: general
      – SubjectFull: Crystal structure
        Type: general
      – SubjectFull: Parameter estimation
        Type: general
    Titles:
      – TitleFull: Polymer as the protecting passivaton layer in fabricating suspended SCS structures in both anisotropic and isotropic etching.
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            NameFull: Yu-Hsin Lin
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            NameFull: Wensyang Hsu
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            – D: 01
              M: 04
              Text: Apr2012
              Type: published
              Y: 2012
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              Value: 22
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            – TitleFull: Journal of Micromechanics & Microengineering
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