Houng, B., & Wang, A. (2012). Characterization of indium tin oxide films by RF-assisted DC magnetron sputtering. Applied Surface Science, 258(15), 5593. https://doi.org/10.1016/j.apsusc.2012.02.030
Chicago Style (17th ed.) CitationHoung, Boen, and Adam Wang. "Characterization of Indium Tin Oxide Films by RF-assisted DC Magnetron Sputtering." Applied Surface Science 258, no. 15 (2012): 5593. https://doi.org/10.1016/j.apsusc.2012.02.030.
MLA (9th ed.) CitationHoung, Boen, and Adam Wang. "Characterization of Indium Tin Oxide Films by RF-assisted DC Magnetron Sputtering." Applied Surface Science, vol. 258, no. 15, 2012, p. 5593, https://doi.org/10.1016/j.apsusc.2012.02.030.
Warning: These citations may not always be 100% accurate.