Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma
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| Title: | Spectroscopic ellipsometry analysis of TiO |
|---|---|
| Authors: | Li, D., Carette, M., Granier, A., Landesman, J.P., Goullet, A. antoine.goullet@univ-nantes.fr |
| Source: | Thin Solid Films. Nov2012, Vol. 522, p366-371. 6p. |
| Subjects: | Silicon, Ellipsometry, Titanium dioxide films, Plasma-enhanced chemical vapor deposition, Low temperatures, Pressure, Refractive index |
| Abstract: | Abstract: TiO2 thin films were deposited at low pressure and temperature on silicon substrates using plasma enhanced chemical vapor deposition in oxygen rich O2/titanium tetraisopropoxide inductively coupled radiofrequency plasmas. The influence of substrate bias Vb (|Vb|≤50V) on the film properties was investigated. The results obtained by fitting ellipsometry spectra in the 1.5–6eV range, using a three-sublayer physical model, are in good agreement with the film morphology when no bias is applied or Vb =−10V. The refractive indices in the transparent range are enhanced at Vb =−50V, according to a physical model which only includes a homogenous layer and a top roughness layer. Scanning electron microscopic views show that all the films exhibit a columnar structure, but layer compactness and organization increase with the bias. The film structure evolution as a function of Vb is also evidenced on the refractive index dispersion curves. Complementary X-ray diffraction and Fourier transform infrared spectroscopy measurements show that films are basically amorphous mixed with a small amount of anatase at the floating potential (Vb =0), whereas applying a bias voltage leads to the enhancement of anatase phase and the appearance of rutile phase (Vb =−50V). [Copyright &y& Elsevier] |
| Copyright of Thin Solid Films is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 83322016 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Spectroscopic ellipsometry analysis of TiO<subscript>2</subscript> films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Li%2C+D%2E%22">Li, D.</searchLink><br /><searchLink fieldCode="AR" term="%22Carette%2C+M%2E%22">Carette, M.</searchLink><br /><searchLink fieldCode="AR" term="%22Granier%2C+A%2E%22">Granier, A.</searchLink><br /><searchLink fieldCode="AR" term="%22Landesman%2C+J%2EP%2E%22">Landesman, J.P.</searchLink><br /><searchLink fieldCode="AR" term="%22Goullet%2C+A%2E%22">Goullet, A.</searchLink><i> antoine.goullet@univ-nantes.fr</i> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Thin+Solid+Films%22">Thin Solid Films</searchLink>. Nov2012, Vol. 522, p366-371. 6p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Silicon%22">Silicon</searchLink><br /><searchLink fieldCode="DE" term="%22Ellipsometry%22">Ellipsometry</searchLink><br /><searchLink fieldCode="DE" term="%22Titanium+dioxide+films%22">Titanium dioxide films</searchLink><br /><searchLink fieldCode="DE" term="%22Plasma-enhanced+chemical+vapor+deposition%22">Plasma-enhanced chemical vapor deposition</searchLink><br /><searchLink fieldCode="DE" term="%22Low+temperatures%22">Low temperatures</searchLink><br /><searchLink fieldCode="DE" term="%22Pressure%22">Pressure</searchLink><br /><searchLink fieldCode="DE" term="%22Refractive+index%22">Refractive index</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: Abstract: TiO2 thin films were deposited at low pressure and temperature on silicon substrates using plasma enhanced chemical vapor deposition in oxygen rich O2/titanium tetraisopropoxide inductively coupled radiofrequency plasmas. The influence of substrate bias Vb (|Vb|≤50V) on the film properties was investigated. The results obtained by fitting ellipsometry spectra in the 1.5–6eV range, using a three-sublayer physical model, are in good agreement with the film morphology when no bias is applied or Vb =−10V. The refractive indices in the transparent range are enhanced at Vb =−50V, according to a physical model which only includes a homogenous layer and a top roughness layer. Scanning electron microscopic views show that all the films exhibit a columnar structure, but layer compactness and organization increase with the bias. The film structure evolution as a function of Vb is also evidenced on the refractive index dispersion curves. Complementary X-ray diffraction and Fourier transform infrared spectroscopy measurements show that films are basically amorphous mixed with a small amount of anatase at the floating potential (Vb =0), whereas applying a bias voltage leads to the enhancement of anatase phase and the appearance of rutile phase (Vb =−50V). [Copyright &y& Elsevier] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Thin Solid Films is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/j.tsf.2012.07.091 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 6 StartPage: 366 Subjects: – SubjectFull: Silicon Type: general – SubjectFull: Ellipsometry Type: general – SubjectFull: Titanium dioxide films Type: general – SubjectFull: Plasma-enhanced chemical vapor deposition Type: general – SubjectFull: Low temperatures Type: general – SubjectFull: Pressure Type: general – SubjectFull: Refractive index Type: general Titles: – TitleFull: Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Li, D. – PersonEntity: Name: NameFull: Carette, M. – PersonEntity: Name: NameFull: Granier, A. – PersonEntity: Name: NameFull: Landesman, J.P. – PersonEntity: Name: NameFull: Goullet, A. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 11 Text: Nov2012 Type: published Y: 2012 Identifiers: – Type: issn-print Value: 00406090 Numbering: – Type: volume Value: 522 Titles: – TitleFull: Thin Solid Films Type: main |
| ResultId | 1 |
