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Ion beam etching of a flat silicon mirror surface: A study of the shape error evolution.

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Title: Ion beam etching of a flat silicon mirror surface: A study of the shape error evolution.
Authors: Preda, I.1,2 ipreda@cells.es, Vivo, A.2, Demarcq, F.2, Berujon, S.2,3, Susini, J.2, Ziegler, E.2
Source: Nuclear Instruments & Methods in Physics Research Section A. May2013, Vol. 710, p98-100. 3p.
Subjects: Focused ion beam etching, Silicon, Mirrors, Surfaces (Physics), Erosion, Surface roughness, Metrology
Abstract: Abstract: An ion beam etching process has been developed to improve the flatness of an X-ray mirror surface. The basic principle consists of moving a mirror at variable and controlled speed under an ion beam whose erosion capability was thoroughly characterized beforehand. At every step of the polishing procedure, several metrology measurements are applied to assess both mirror figure and finish. Two flat-shaped mirrors were produced to demonstrate the capability of the approach. The residual slope error was measured to be of 70nrad over a mirror length of 70mm while the root mean roughness remained statistically unaffected. [Copyright &y& Elsevier]
Copyright of Nuclear Instruments & Methods in Physics Research Section A is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
Database: Engineering Source
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Header DbId: egs
DbLabel: Engineering Source
An: 89159780
AccessLevel: 6
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Ion beam etching of a flat silicon mirror surface: A study of the shape error evolution.
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  Data: <searchLink fieldCode="AR" term="%22Preda%2C+I%2E%22">Preda, I.</searchLink><relatesTo>1,2</relatesTo><i> ipreda@cells.es</i><br /><searchLink fieldCode="AR" term="%22Vivo%2C+A%2E%22">Vivo, A.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Demarcq%2C+F%2E%22">Demarcq, F.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Berujon%2C+S%2E%22">Berujon, S.</searchLink><relatesTo>2,3</relatesTo><br /><searchLink fieldCode="AR" term="%22Susini%2C+J%2E%22">Susini, J.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Ziegler%2C+E%2E%22">Ziegler, E.</searchLink><relatesTo>2</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Nuclear+Instruments+%26+Methods+in+Physics+Research+Section+A%22">Nuclear Instruments & Methods in Physics Research Section A</searchLink>. May2013, Vol. 710, p98-100. 3p.
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  Data: <searchLink fieldCode="DE" term="%22Focused+ion+beam+etching%22">Focused ion beam etching</searchLink><br /><searchLink fieldCode="DE" term="%22Silicon%22">Silicon</searchLink><br /><searchLink fieldCode="DE" term="%22Mirrors%22">Mirrors</searchLink><br /><searchLink fieldCode="DE" term="%22Surfaces+%28Physics%29%22">Surfaces (Physics)</searchLink><br /><searchLink fieldCode="DE" term="%22Erosion%22">Erosion</searchLink><br /><searchLink fieldCode="DE" term="%22Surface+roughness%22">Surface roughness</searchLink><br /><searchLink fieldCode="DE" term="%22Metrology%22">Metrology</searchLink>
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  Data: Abstract: An ion beam etching process has been developed to improve the flatness of an X-ray mirror surface. The basic principle consists of moving a mirror at variable and controlled speed under an ion beam whose erosion capability was thoroughly characterized beforehand. At every step of the polishing procedure, several metrology measurements are applied to assess both mirror figure and finish. Two flat-shaped mirrors were produced to demonstrate the capability of the approach. The residual slope error was measured to be of 70nrad over a mirror length of 70mm while the root mean roughness remained statistically unaffected. [Copyright &y& Elsevier]
– Name: AbstractSuppliedCopyright
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  Data: <i>Copyright of Nuclear Instruments & Methods in Physics Research Section A is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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      – Type: doi
        Value: 10.1016/j.nima.2012.10.136
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      – Code: eng
        Text: English
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      – SubjectFull: Focused ion beam etching
        Type: general
      – SubjectFull: Silicon
        Type: general
      – SubjectFull: Mirrors
        Type: general
      – SubjectFull: Surfaces (Physics)
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      – SubjectFull: Erosion
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      – SubjectFull: Surface roughness
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      – SubjectFull: Metrology
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      – TitleFull: Ion beam etching of a flat silicon mirror surface: A study of the shape error evolution.
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              Text: May2013
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