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Analysis of high-purity materials by inductively coupled plasma mass spectrometry (Review)

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Title: Analysis of high-purity materials by inductively coupled plasma mass spectrometry (Review)
Authors: Karandashev, V. K.1 gkv@giredmet.ru, Zhernokleeva, K. V.2, Baranovskaya, V. B.2, Karpov, Yu. A.2
Source: Inorganic Materials. Dec2013, Vol. 49 Issue 12, p1249-1263. 15p.
Subjects: Inductively coupled plasma mass spectrometry techniques, Semiconductor analysis, Metallic oxides, Metal analysis, Dissolution (Chemistry), Metals spectra, Chemical decomposition, Chromatographic analysis
Abstract: A review of the works dedicated to the application of the method of inductively coupled plasma mass spectrometry (ICP-MS) to the analysis of high-purity materials (semiconductors, metals, and their oxides) and published after 2004 is presented. The limitations of this method in the analysis of such objects are discussed. Advantages and disadvantages are demonstrated for three principal ways of the application of the ICP-MS method to the analysis of high-purity materials: direct analysis of a solid sample (laser ablation and injection of a sample in the form of a suspension); preliminary dissolution of an analyte sample; utilization of the approach separating analytes and matrix. [ABSTRACT FROM AUTHOR]
Copyright of Inorganic Materials is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: <searchLink fieldCode="DE" term="%22Inductively+coupled+plasma+mass+spectrometry+techniques%22">Inductively coupled plasma mass spectrometry techniques</searchLink><br /><searchLink fieldCode="DE" term="%22Semiconductor+analysis%22">Semiconductor analysis</searchLink><br /><searchLink fieldCode="DE" term="%22Metallic+oxides%22">Metallic oxides</searchLink><br /><searchLink fieldCode="DE" term="%22Metal+analysis%22">Metal analysis</searchLink><br /><searchLink fieldCode="DE" term="%22Dissolution+%28Chemistry%29%22">Dissolution (Chemistry)</searchLink><br /><searchLink fieldCode="DE" term="%22Metals+spectra%22">Metals spectra</searchLink><br /><searchLink fieldCode="DE" term="%22Chemical+decomposition%22">Chemical decomposition</searchLink><br /><searchLink fieldCode="DE" term="%22Chromatographic+analysis%22">Chromatographic analysis</searchLink>
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  Data: A review of the works dedicated to the application of the method of inductively coupled plasma mass spectrometry (ICP-MS) to the analysis of high-purity materials (semiconductors, metals, and their oxides) and published after 2004 is presented. The limitations of this method in the analysis of such objects are discussed. Advantages and disadvantages are demonstrated for three principal ways of the application of the ICP-MS method to the analysis of high-purity materials: direct analysis of a solid sample (laser ablation and injection of a sample in the form of a suspension); preliminary dissolution of an analyte sample; utilization of the approach separating analytes and matrix. [ABSTRACT FROM AUTHOR]
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  Data: <i>Copyright of Inorganic Materials is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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