Bibliographic Details
| Title: |
Analysis of high-purity materials by inductively coupled plasma mass spectrometry (Review) |
| Authors: |
Karandashev, V. K.1 gkv@giredmet.ru, Zhernokleeva, K. V.2, Baranovskaya, V. B.2, Karpov, Yu. A.2 |
| Source: |
Inorganic Materials. Dec2013, Vol. 49 Issue 12, p1249-1263. 15p. |
| Subjects: |
Inductively coupled plasma mass spectrometry techniques, Semiconductor analysis, Metallic oxides, Metal analysis, Dissolution (Chemistry), Metals spectra, Chemical decomposition, Chromatographic analysis |
| Abstract: |
A review of the works dedicated to the application of the method of inductively coupled plasma mass spectrometry (ICP-MS) to the analysis of high-purity materials (semiconductors, metals, and their oxides) and published after 2004 is presented. The limitations of this method in the analysis of such objects are discussed. Advantages and disadvantages are demonstrated for three principal ways of the application of the ICP-MS method to the analysis of high-purity materials: direct analysis of a solid sample (laser ablation and injection of a sample in the form of a suspension); preliminary dissolution of an analyte sample; utilization of the approach separating analytes and matrix. [ABSTRACT FROM AUTHOR] |
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| Database: |
Engineering Source |
