APA (7th ed.) Citation

Kwon, G., Lee, H., Chu, H., Yoo, J., Kim, H., Han, C., . . . Lee, J. (2012). Fabrication of uniform and high resolution copper nanowire using intermediate self-assembled monolayers through direct AFM lithography. Nanotechnology, 23(18), 1. https://doi.org/10.1088/0957-4484/23/18/185307

Chicago Style (17th ed.) Citation

Kwon, G., H. Lee, H. Chu, J. Yoo, H. Kim, C. Han, C. Chung, and J. Lee. "Fabrication of Uniform and High Resolution Copper Nanowire Using Intermediate Self-assembled Monolayers Through Direct AFM Lithography." Nanotechnology 23, no. 18 (2012): 1. https://doi.org/10.1088/0957-4484/23/18/185307.

MLA (9th ed.) Citation

Kwon, G., et al. "Fabrication of Uniform and High Resolution Copper Nanowire Using Intermediate Self-assembled Monolayers Through Direct AFM Lithography." Nanotechnology, vol. 23, no. 18, 2012, p. 1, https://doi.org/10.1088/0957-4484/23/18/185307.