APA (7th ed.) Citation

Tian, H., Feng, L., & Liu, Z. (2014). Effect of N2/Ar flow ratio on the structural and electrical properties of SrHfON thin films prepared by magnetron sputtering. Vacuum, 109, 139. https://doi.org/10.1016/j.vacuum.2014.07.005

Chicago Style (17th ed.) Citation

Tian, Hao, Li-ping Feng, and Zheng-tang Liu. "Effect of N2/Ar Flow Ratio on the Structural and Electrical Properties of SrHfON Thin Films Prepared by Magnetron Sputtering." Vacuum 109 (2014): 139. https://doi.org/10.1016/j.vacuum.2014.07.005.

MLA (9th ed.) Citation

Tian, Hao, et al. "Effect of N2/Ar Flow Ratio on the Structural and Electrical Properties of SrHfON Thin Films Prepared by Magnetron Sputtering." Vacuum, vol. 109, 2014, p. 139, https://doi.org/10.1016/j.vacuum.2014.07.005.