Rapid soda-lime glass etching process for producing microfluidic channels with higher aspect ratio.

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Title: Rapid soda-lime glass etching process for producing microfluidic channels with higher aspect ratio.
Authors: Lin, Che-Hsin1 chehsin@mail.nsysu.edu.tw, Chen, Kuan-Wei1, Li, Tang-Yu1
Source: Microsystem Technologies. Oct2014, Vol. 20 Issue 10/11, p1905-1911. 7p.
Subjects: Glass etching, Microfluidics, Microchannel flow, Photoresists, Sodium carbonate, Lime (Minerals)
Abstract: This paper presents a simple method to produce microfluidic channels in soda-lime glasses with the aspect ratio >0.5 utilizing a modified wet etching protocol. A low-cost positive photoresist (PR) layer is used as the etching mask for the wet etching process. Prior to the PR and primer coating procedure, a UV activation process is adopted for enhancing the binding strength of the hexamethyldisilazane primer layer and the glass substrate, resulting in an better adhesion for the PR layer. A fast etching recipe is also developed by increasing the acidity and the temperature of the buffered oxide (BOE) etchant. Since the photoresist etching mask does not peel during the etching process shortly, the structure of the etching mask forms a barrier and results in a different diffusion rate for the etchant inside the etched trench structure. A slower etching rate for the glass is observed at the undercut region such that the proposed anisotropic etching pattern can be achieved. Results show that the etching rate of the modified glass etching process is as high as 7.7 μm/min which is much faster than that of pure BOE etchant (0.96 μm/min). Sealed microfluidic channel with the aspect ratio of around 0.62 is produced with the developed method. The method developed in the present study provides a rapid and efficient way to produce microfluidic channels with higher aspect ratio. [ABSTRACT FROM AUTHOR]
Copyright of Microsystem Technologies is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: Rapid soda-lime glass etching process for producing microfluidic channels with higher aspect ratio.
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  Data: <searchLink fieldCode="AR" term="%22Lin%2C+Che-Hsin%22">Lin, Che-Hsin</searchLink><relatesTo>1</relatesTo><i> chehsin@mail.nsysu.edu.tw</i><br /><searchLink fieldCode="AR" term="%22Chen%2C+Kuan-Wei%22">Chen, Kuan-Wei</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Li%2C+Tang-Yu%22">Li, Tang-Yu</searchLink><relatesTo>1</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Microsystem+Technologies%22">Microsystem Technologies</searchLink>. Oct2014, Vol. 20 Issue 10/11, p1905-1911. 7p.
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  Data: <searchLink fieldCode="DE" term="%22Glass+etching%22">Glass etching</searchLink><br /><searchLink fieldCode="DE" term="%22Microfluidics%22">Microfluidics</searchLink><br /><searchLink fieldCode="DE" term="%22Microchannel+flow%22">Microchannel flow</searchLink><br /><searchLink fieldCode="DE" term="%22Photoresists%22">Photoresists</searchLink><br /><searchLink fieldCode="DE" term="%22Sodium+carbonate%22">Sodium carbonate</searchLink><br /><searchLink fieldCode="DE" term="%22Lime+%28Minerals%29%22">Lime (Minerals)</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: This paper presents a simple method to produce microfluidic channels in soda-lime glasses with the aspect ratio >0.5 utilizing a modified wet etching protocol. A low-cost positive photoresist (PR) layer is used as the etching mask for the wet etching process. Prior to the PR and primer coating procedure, a UV activation process is adopted for enhancing the binding strength of the hexamethyldisilazane primer layer and the glass substrate, resulting in an better adhesion for the PR layer. A fast etching recipe is also developed by increasing the acidity and the temperature of the buffered oxide (BOE) etchant. Since the photoresist etching mask does not peel during the etching process shortly, the structure of the etching mask forms a barrier and results in a different diffusion rate for the etchant inside the etched trench structure. A slower etching rate for the glass is observed at the undercut region such that the proposed anisotropic etching pattern can be achieved. Results show that the etching rate of the modified glass etching process is as high as 7.7 μm/min which is much faster than that of pure BOE etchant (0.96 μm/min). Sealed microfluidic channel with the aspect ratio of around 0.62 is produced with the developed method. The method developed in the present study provides a rapid and efficient way to produce microfluidic channels with higher aspect ratio. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
  Label:
  Group: Ab
  Data: <i>Copyright of Microsystem Technologies is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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      – Type: doi
        Value: 10.1007/s00542-013-1980-z
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      – Code: eng
        Text: English
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        PageCount: 7
        StartPage: 1905
    Subjects:
      – SubjectFull: Glass etching
        Type: general
      – SubjectFull: Microfluidics
        Type: general
      – SubjectFull: Microchannel flow
        Type: general
      – SubjectFull: Photoresists
        Type: general
      – SubjectFull: Sodium carbonate
        Type: general
      – SubjectFull: Lime (Minerals)
        Type: general
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      – TitleFull: Rapid soda-lime glass etching process for producing microfluidic channels with higher aspect ratio.
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            NameFull: Lin, Che-Hsin
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            NameFull: Chen, Kuan-Wei
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            NameFull: Li, Tang-Yu
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            – D: 01
              M: 10
              Text: Oct2014
              Type: published
              Y: 2014
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              Value: 20
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              Value: 10/11
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            – TitleFull: Microsystem Technologies
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