Low-cost photomask fabrication using laser ablation.
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| Title: | Low-cost photomask fabrication using laser ablation. |
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| Authors: | Legeay, G.1, Castel, X.1 xavier.castel@univ-rennes1.fr, Benzerga, R.1, Moussavou, A.-G.2,3, Sauleau, R.2, Guilloux-Viry, M.3 |
| Source: | Journal of Materials Processing Technology. Feb2015, Vol. 216, p71-78. 8p. |
| Subjects: | Photomasks, Nanofabrication, Laser ablation, Excimer lasers, Sputtering (Physics), Nitrocellulose, Metallic films |
| Abstract: | A specific fabrication process has been developed to produce low-cost photomasks using standard consumer products. This process is based on an indirect route, using a numerically controlled excimer laser (KrF) etching technique. It begins with RF-sputtering deposition of a titanium film (200 nm-thick) on float glass substrate. Then a nitrocellulose lacquer, serving as a self-developing resist, is spin-coated on titanium. It is ablated with partially overlapping laser impacts and undergoes self-combustion under laser beam. Proper heat treatments are applied before and after laser ablation to circumvent smearing and adhesion problems. Finally the titanium layer is wet etched through the openings in the resist by dilute hydrofluoric acid. Both nitrocellulose lacquer characterization and laser parameters are discussed. The resolution achieved here (10 μm, limited by diffraction effects of the laser optics and by side heating of the resist due to the titanium film) is suitable for the fabrication of microwave devices. To confirm the suitability of the proposed process, several photomasks have been fabricated to pattern coplanar tunable stub resonators on ferroelectric KTa 0.5 Nb 0.5 O 3 thin films. The dielectric permittivity of the KTa 0.5 Nb 0.5 O 3 material is controlled by DC biasing. A 18% tunability of the stub resonance frequency has been measured in X -band (close to 10 GHz), validating thereby the whole patterning process. [ABSTRACT FROM AUTHOR] |
| Copyright of Journal of Materials Processing Technology is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.) | |
| Database: | Engineering Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: egs DbLabel: Engineering Source An: 99736119 AccessLevel: 6 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Low-cost photomask fabrication using laser ablation. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AR" term="%22Legeay%2C+G%2E%22">Legeay, G.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Castel%2C+X%2E%22">Castel, X.</searchLink><relatesTo>1</relatesTo><i> xavier.castel@univ-rennes1.fr</i><br /><searchLink fieldCode="AR" term="%22Benzerga%2C+R%2E%22">Benzerga, R.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AR" term="%22Moussavou%2C+A%2E-G%2E%22">Moussavou, A.-G.</searchLink><relatesTo>2,3</relatesTo><br /><searchLink fieldCode="AR" term="%22Sauleau%2C+R%2E%22">Sauleau, R.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AR" term="%22Guilloux-Viry%2C+M%2E%22">Guilloux-Viry, M.</searchLink><relatesTo>3</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Materials+Processing+Technology%22">Journal of Materials Processing Technology</searchLink>. Feb2015, Vol. 216, p71-78. 8p. – Name: Subject Label: Subjects Group: Su Data: <searchLink fieldCode="DE" term="%22Photomasks%22">Photomasks</searchLink><br /><searchLink fieldCode="DE" term="%22Nanofabrication%22">Nanofabrication</searchLink><br /><searchLink fieldCode="DE" term="%22Laser+ablation%22">Laser ablation</searchLink><br /><searchLink fieldCode="DE" term="%22Excimer+lasers%22">Excimer lasers</searchLink><br /><searchLink fieldCode="DE" term="%22Sputtering+%28Physics%29%22">Sputtering (Physics)</searchLink><br /><searchLink fieldCode="DE" term="%22Nitrocellulose%22">Nitrocellulose</searchLink><br /><searchLink fieldCode="DE" term="%22Metallic+films%22">Metallic films</searchLink> – Name: Abstract Label: Abstract Group: Ab Data: A specific fabrication process has been developed to produce low-cost photomasks using standard consumer products. This process is based on an indirect route, using a numerically controlled excimer laser (KrF) etching technique. It begins with RF-sputtering deposition of a titanium film (200 nm-thick) on float glass substrate. Then a nitrocellulose lacquer, serving as a self-developing resist, is spin-coated on titanium. It is ablated with partially overlapping laser impacts and undergoes self-combustion under laser beam. Proper heat treatments are applied before and after laser ablation to circumvent smearing and adhesion problems. Finally the titanium layer is wet etched through the openings in the resist by dilute hydrofluoric acid. Both nitrocellulose lacquer characterization and laser parameters are discussed. The resolution achieved here (10 μm, limited by diffraction effects of the laser optics and by side heating of the resist due to the titanium film) is suitable for the fabrication of microwave devices. To confirm the suitability of the proposed process, several photomasks have been fabricated to pattern coplanar tunable stub resonators on ferroelectric KTa 0.5 Nb 0.5 O 3 thin films. The dielectric permittivity of the KTa 0.5 Nb 0.5 O 3 material is controlled by DC biasing. A 18% tunability of the stub resonance frequency has been measured in X -band (close to 10 GHz), validating thereby the whole patterning process. [ABSTRACT FROM AUTHOR] – Name: AbstractSuppliedCopyright Label: Group: Ab Data: <i>Copyright of Journal of Materials Processing Technology is the property of Elsevier B.V. and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.) |
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| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/j.jmatprotec.2014.08.024 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 8 StartPage: 71 Subjects: – SubjectFull: Photomasks Type: general – SubjectFull: Nanofabrication Type: general – SubjectFull: Laser ablation Type: general – SubjectFull: Excimer lasers Type: general – SubjectFull: Sputtering (Physics) Type: general – SubjectFull: Nitrocellulose Type: general – SubjectFull: Metallic films Type: general Titles: – TitleFull: Low-cost photomask fabrication using laser ablation. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Legeay, G. – PersonEntity: Name: NameFull: Castel, X. – PersonEntity: Name: NameFull: Benzerga, R. – PersonEntity: Name: NameFull: Moussavou, A.-G. – PersonEntity: Name: NameFull: Sauleau, R. – PersonEntity: Name: NameFull: Guilloux-Viry, M. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 02 Text: Feb2015 Type: published Y: 2015 Identifiers: – Type: issn-print Value: 09240136 Numbering: – Type: volume Value: 216 Titles: – TitleFull: Journal of Materials Processing Technology Type: main |
| ResultId | 1 |
