Deposition of Oxidation-Resistant Hard Aluminide Layers on Hastelloy C-276: A Study on Microstructural and Kinetic Analysis.
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| Title: | Deposition of Oxidation-Resistant Hard Aluminide Layers on Hastelloy C-276: A Study on Microstructural and Kinetic Analysis. |
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| Authors: | Yener, Tuba1 (AUTHOR), Alaoğlu, Muhammed2,3 (AUTHOR), Atapek, Ş. Hakan4 (AUTHOR) hatapek@kocaeli.edu.tr, Aktaş Çelik, Gülşah4 (AUTHOR), Yener, S. Çağrı5,6 (AUTHOR), Özsoy, Neslihan7 (AUTHOR) |
| Source: | Arabian Journal for Science & Engineering (Springer Science & Business Media B.V. ). Feb2026, Vol. 51 Issue 3, p3129-3144. 16p. |
| Subject Terms: | *Protective coatings, *Diffusion control, *Chemical kinetics, *Microstructure, *Activation energy, *Alloys, *Nickel-aluminum alloys, *Surface coatings |
| Abstract: | By aluminizing at varying temperature (600–700 °C) and time (2–6 h) cycles, defect-free, continuous and homogeneous thick Ni–Al deposition layers are obtained on Hastelloy C276 surface. Metallurgical analysis performed on surface/sub-surface indicates that NiAl3 and Ni2Al3 phases are the dominant phases within aluminide coatings (11–41 μm). Since the experimental aluminizing process is a diffusion-controlled process, the processing output with variable temperature and time parameters made it possible to study the process kinetics, and the process-specific activation energy is calculated as 51 kJ/mol. An equation is also derived from the regression model to estimate the coating thickness, and there is a good agreement between the coating thicknesses determined by the experimental and calculated values. The effect of temperature/time on the layer thickness is investigated with variance analysis. Although no significant change in the surface hardness value (~ 800 HV) is measured regardless of the layer thickness, an increase in the layer thickness over time on material surface processed at the lowest temperature causes a significant decrease in the oxidation rate due to the presence of a stable Al-rich oxide. All these findings reveal the lowest cost coating conditions that can reduce the chemical degradation of Hastelloy C276 caused by oxidation at high temperatures. [ABSTRACT FROM AUTHOR] |
| Database: | Energy & Power Source |
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| Abstract: | By aluminizing at varying temperature (600–700 °C) and time (2–6 h) cycles, defect-free, continuous and homogeneous thick Ni–Al deposition layers are obtained on Hastelloy C276 surface. Metallurgical analysis performed on surface/sub-surface indicates that NiAl3 and Ni2Al3 phases are the dominant phases within aluminide coatings (11–41 μm). Since the experimental aluminizing process is a diffusion-controlled process, the processing output with variable temperature and time parameters made it possible to study the process kinetics, and the process-specific activation energy is calculated as 51 kJ/mol. An equation is also derived from the regression model to estimate the coating thickness, and there is a good agreement between the coating thicknesses determined by the experimental and calculated values. The effect of temperature/time on the layer thickness is investigated with variance analysis. Although no significant change in the surface hardness value (~ 800 HV) is measured regardless of the layer thickness, an increase in the layer thickness over time on material surface processed at the lowest temperature causes a significant decrease in the oxidation rate due to the presence of a stable Al-rich oxide. All these findings reveal the lowest cost coating conditions that can reduce the chemical degradation of Hastelloy C276 caused by oxidation at high temperatures. [ABSTRACT FROM AUTHOR] |
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| ISSN: | 2193567X |
| DOI: | 10.1007/s13369-025-10210-0 |
