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ROLE OF RADIOFREQUENCY POWER ON THE CRYSTALLOGRAPHIC, MORPHOLOGICAL AND OPTICAL PROPERTIES OF SPUTTERED ALUMINUM THIN FILMS.

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Title: ROLE OF RADIOFREQUENCY POWER ON THE CRYSTALLOGRAPHIC, MORPHOLOGICAL AND OPTICAL PROPERTIES OF SPUTTERED ALUMINUM THIN FILMS.
Alternate Title: PAPEL DE LA POTENCIA DE LA RADIOFRECUENCIA EN LAS PROPIEDADES CRISTALOGRÁFICAS, MORFOLÓGICAS Y ÓPTICAS DE LAS CAPAS DELGADAS DE ALUMINIO DEPOSITADAS MEDIANTE SPUTTERING.
Authors: RAMOS-BLAZQUEZ, R.1, SOLIS-POMAR, F.1 francisco.solispm@uanl.edu.mx, FUNDORA-CRUZO, A.2, COLLADO-HERNANDEZ, A.1, GARCIA-RODRIGUEZ, C.1, MARTÍNEZ-CARREÓN, M. J.1, MARTINEZ-HUERTA, A. FRAGIEL A.3, PEREZ-TIJERINA, E.1
Source: Revista Cubana de Física. 12/15/2025, Vol. 42 Issue 2, p113-119. 7p.
Subjects: ALUMINUM films, MAGNETRON sputtering, X-ray diffraction, OPTICAL properties, MORPHOLOGY, CRYSTALLOGRAPHY, SCANNING electron microscopy, ULTRAVIOLET-visible spectroscopy
Abstract (English): Aluminum (Al) thin films are of great interest for applications in telecommunications, microelectronics, and the automotive industry, among others, due to their high conductivity, excellent optical properties and low weight. Their properties depend on the depositition technique and its parameters. In this work, the crystallographic, morphological, and optical characteristics of Al thin films grown by radio-frequency (RF) magnetron sputtering were analyzed. An aluminum target was used in an argon (Ar) atmosphere, and the effect of sputtering power on film properties was investigated. The samples were characterized by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), and UV-Vis Spectroscopy. The crystalline quality improved with increasing power. AFM and SEM results revealed an increase in roughness, thickness, and grain size with higher sputtering power. UV-Vis spectroscopy showed lower diffuse reflectance at lower power across the 190-900 nm range. The enhancement of film properties is mostly attributed to the increased kinetic energy of sputtered species, directly related to the applied RF power. [ABSTRACT FROM AUTHOR]
Abstract (Spanish): Las películas delgadas de aluminio (Al) son de gran interés para aplicaciones en telecomunicaciones, microelectrónica y la industria automotriz, entre otras, debido a su alta conductividad, excelentes propiedades ópticas y bajo peso. Sus propiedades dependen de la técnica de depósito y sus parámetros. En este trabajo, se analizaron las características cristalográficas, morfológicas y ópticas de películas delgadas de Al crecidas mediante pulverización catódica (sputtering) magnetrón de radiofrecuencia (RF). Se utilizó un blanco de aluminio en una atmósfera de argón (Ar), y se investigó el efecto de la potencia de pulverización en las propiedades de la película. Las muestras se caracterizaron por Difracción de Rayos X (XRD), Microscopía Electrónica de Barrido (SEM), Microscopía de Fuerza Atómica (AFM) y Espectroscopía UV-Vis. La calidad cristalina mejoró al aumentar la potencia. Los resultados de AFM y SEM revelaron un aumento en la rugosidad, el espesor y el tamaño de grano con una mayor potencia de pulverización. La espectroscopía UV-Vis mostró una menor reflectancia difusa a menor potencia en el rango de 190-900 nm. La mejora de las propiedades de la película se atribuye principalmente al aumento de la energía cinética de las especies pulverizadas, directamente relacionada con la potencia de RF aplicada. [ABSTRACT FROM AUTHOR]
Copyright of Revista Cubana de Física is the property of Universidad de La Habana and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Data: ROLE OF RADIOFREQUENCY POWER ON THE CRYSTALLOGRAPHIC, MORPHOLOGICAL AND OPTICAL PROPERTIES OF SPUTTERED ALUMINUM THIN FILMS.
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  Data: PAPEL DE LA POTENCIA DE LA RADIOFRECUENCIA EN LAS PROPIEDADES CRISTALOGRÁFICAS, MORFOLÓGICAS Y ÓPTICAS DE LAS CAPAS DELGADAS DE ALUMINIO DEPOSITADAS MEDIANTE SPUTTERING.
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  Data: <searchLink fieldCode="JN" term="%22Revista+Cubana+de+Física%22">Revista Cubana de Física</searchLink>. 12/15/2025, Vol. 42 Issue 2, p113-119. 7p.
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  Data: <searchLink fieldCode="DE" term="%22ALUMINUM+films%22">ALUMINUM films</searchLink><br /><searchLink fieldCode="DE" term="%22MAGNETRON+sputtering%22">MAGNETRON sputtering</searchLink><br /><searchLink fieldCode="DE" term="%22X-ray+diffraction%22">X-ray diffraction</searchLink><br /><searchLink fieldCode="DE" term="%22OPTICAL+properties%22">OPTICAL properties</searchLink><br /><searchLink fieldCode="DE" term="%22MORPHOLOGY%22">MORPHOLOGY</searchLink><br /><searchLink fieldCode="DE" term="%22CRYSTALLOGRAPHY%22">CRYSTALLOGRAPHY</searchLink><br /><searchLink fieldCode="DE" term="%22SCANNING+electron+microscopy%22">SCANNING electron microscopy</searchLink><br /><searchLink fieldCode="DE" term="%22ULTRAVIOLET-visible+spectroscopy%22">ULTRAVIOLET-visible spectroscopy</searchLink>
– Name: Abstract
  Label: Abstract (English)
  Group: Ab
  Data: Aluminum (Al) thin films are of great interest for applications in telecommunications, microelectronics, and the automotive industry, among others, due to their high conductivity, excellent optical properties and low weight. Their properties depend on the depositition technique and its parameters. In this work, the crystallographic, morphological, and optical characteristics of Al thin films grown by radio-frequency (RF) magnetron sputtering were analyzed. An aluminum target was used in an argon (Ar) atmosphere, and the effect of sputtering power on film properties was investigated. The samples were characterized by X-ray diffraction (XRD), Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), and UV-Vis Spectroscopy. The crystalline quality improved with increasing power. AFM and SEM results revealed an increase in roughness, thickness, and grain size with higher sputtering power. UV-Vis spectroscopy showed lower diffuse reflectance at lower power across the 190-900 nm range. The enhancement of film properties is mostly attributed to the increased kinetic energy of sputtered species, directly related to the applied RF power. [ABSTRACT FROM AUTHOR]
– Name: Abstract
  Label: Abstract (Spanish)
  Group: Ab
  Data: Las películas delgadas de aluminio (Al) son de gran interés para aplicaciones en telecomunicaciones, microelectrónica y la industria automotriz, entre otras, debido a su alta conductividad, excelentes propiedades ópticas y bajo peso. Sus propiedades dependen de la técnica de depósito y sus parámetros. En este trabajo, se analizaron las características cristalográficas, morfológicas y ópticas de películas delgadas de Al crecidas mediante pulverización catódica (sputtering) magnetrón de radiofrecuencia (RF). Se utilizó un blanco de aluminio en una atmósfera de argón (Ar), y se investigó el efecto de la potencia de pulverización en las propiedades de la película. Las muestras se caracterizaron por Difracción de Rayos X (XRD), Microscopía Electrónica de Barrido (SEM), Microscopía de Fuerza Atómica (AFM) y Espectroscopía UV-Vis. La calidad cristalina mejoró al aumentar la potencia. Los resultados de AFM y SEM revelaron un aumento en la rugosidad, el espesor y el tamaño de grano con una mayor potencia de pulverización. La espectroscopía UV-Vis mostró una menor reflectancia difusa a menor potencia en el rango de 190-900 nm. La mejora de las propiedades de la película se atribuye principalmente al aumento de la energía cinética de las especies pulverizadas, directamente relacionada con la potencia de RF aplicada. [ABSTRACT FROM AUTHOR]
– Name: AbstractSuppliedCopyright
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  Data: <i>Copyright of Revista Cubana de Física is the property of Universidad de La Habana and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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      – Code: eng
        Text: English
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        StartPage: 113
    Subjects:
      – SubjectFull: ALUMINUM films
        Type: general
      – SubjectFull: MAGNETRON sputtering
        Type: general
      – SubjectFull: X-ray diffraction
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      – SubjectFull: OPTICAL properties
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      – SubjectFull: MORPHOLOGY
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      – SubjectFull: CRYSTALLOGRAPHY
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      – SubjectFull: SCANNING electron microscopy
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      – SubjectFull: ULTRAVIOLET-visible spectroscopy
        Type: general
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      – TitleFull: ROLE OF RADIOFREQUENCY POWER ON THE CRYSTALLOGRAPHIC, MORPHOLOGICAL AND OPTICAL PROPERTIES OF SPUTTERED ALUMINUM THIN FILMS.
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              Text: 12/15/2025
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