Identification, growth and toxicity assessment of Coolia Meunier (Dinophyceae) from Nova Scotia, Canada.
Saved in:
| Title: | Identification, growth and toxicity assessment of Coolia Meunier (Dinophyceae) from Nova Scotia, Canada. |
|---|---|
| Authors: | Lewis NI; Measurement Science and Standards, National Research Council Canada, 1411 Oxford St., Halifax, NS, B3H 3Z1, Canada. Electronic address: Nancy.Lewis@nrc-cnrc.gc.ca., Wolny JL; Maryland Department of Natural Resources, 1919 Lincoln Drive, Annapolis, MD, 21401, USA. Electronic address: Jennifer.Wolny@maryland.gov., Achenbach JC; Measurement Science and Standards, National Research Council Canada, 1411 Oxford St., Halifax, NS, B3H 3Z1, Canada. Electronic address: John.Achenbach@nrc-cnrc.gc.ca., Ellis L; Measurement Science and Standards, National Research Council Canada, 1411 Oxford St., Halifax, NS, B3H 3Z1, Canada. Electronic address: Lee.Ellis@nrc-cnrc.gc.ca., Pitula JS; Department of Natural Sciences, University of Maryland Eastern Shore, Princess Anne, MD, 21853, USA. Electronic address: jspitula@umes.edu., Rafuse C; Measurement Science and Standards, National Research Council Canada, 1411 Oxford St., Halifax, NS, B3H 3Z1, Canada. Electronic address: Cheryl.Rafuse@nrc-cnrc.gc.ca., Rosales DS; Department of Natural Sciences, University of Maryland Eastern Shore, Princess Anne, MD, 21853, USA. Electronic address: drosales@umes.edu., McCarron P; Measurement Science and Standards, National Research Council Canada, 1411 Oxford St., Halifax, NS, B3H 3Z1, Canada. Electronic address: Pearse.McCarron@nrc-cnrc.gc.ca. |
| Source: | Harmful algae [Harmful Algae] 2018 May; Vol. 75, pp. 45-56. Date of Electronic Publication: 2018 Apr 27. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: Elsevier Country of Publication: Netherlands NLM ID: 101128968 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1878-1470 (Electronic) Linking ISSN: 15689883 NLM ISO Abbreviation: Harmful Algae Subsets: MEDLINE |
| Database: | MEDLINE Ultimate |
Be the first to leave a comment!
