Thick, Adherent Diamond Films on AlN with Low Thermal Barrier Resistance.
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| Title: | Thick, Adherent Diamond Films on AlN with Low Thermal Barrier Resistance. |
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| Authors: | Mandal S, Yuan C; Center for Device Thermography and Reliability , University of Bristol , Bristol BS8 1TL , U.K., Massabuau F; Department of Materials Science & Metallurgy , University of Cambridge , Cambridge CB3 0FS , U.K., Pomeroy JW; Center for Device Thermography and Reliability , University of Bristol , Bristol BS8 1TL , U.K., Cuenca J, Bland H, Thomas E, Wallis D; Department of Materials Science & Metallurgy , University of Cambridge , Cambridge CB3 0FS , U.K., Batten T; Renishaw plc. , Wotton-under-Edge GL12 7DW , U.K., Morgan D; Cardiff Catalysis Institute, School of Chemistry , Cardiff University , Cardiff CF10 3AT , U.K., Oliver R; Department of Materials Science & Metallurgy , University of Cambridge , Cambridge CB3 0FS , U.K., Kuball M; Center for Device Thermography and Reliability , University of Bristol , Bristol BS8 1TL , U.K., Williams OA |
| Source: | ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2019 Oct 30; Vol. 11 (43), pp. 40826-40834. Date of Electronic Publication: 2019 Oct 21. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
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