Oral contraceptive and intrauterine device use and the risk of cervical intraepithelial neoplasia grade III or worse: a population-based study.
Saved in:
| Title: | Oral contraceptive and intrauterine device use and the risk of cervical intraepithelial neoplasia grade III or worse: a population-based study. |
|---|---|
| Authors: | Loopik DL; Department of Obstetrics and Gynaecology, Radboud Institute for Molecular Life Sciences, Radboud university medical center, PO Box 9101, 6500HB, Nijmegen, the Netherlands. Electronic address: diede.loopik@radboudumc.nl., IntHout J; Department of Biostatistics, Radboud Institute for Health Sciences, Radboud university medical center, PO Box 9101, 6585KM, Nijmegen, the Netherlands. Electronic address: Joanna.intHout@radboudumc.nl., Melchers WJG; Department of Medical Microbiology, Radboud university medical center, PO Box 9101, 6500HB, Nijmegen, the Netherlands. Electronic address: willem.melchers@radboudumc.nl., Massuger LFAG; Department of Obstetrics and Gynaecology, Radboud university medical center, PO Box 9101, 6500HB, Nijmegen, the Netherlands. Electronic address: leon.massuger@radboudumc.nl., Bekkers RLM; Department of Obstetrics and Gynaecology, Catharina Hospital, PO Box 1350, 5602ZA, Eindhoven, the Netherlands. Electronic address: ruud.bekkers@radboudumc.nl., Siebers AG; Department of Pathology, Radboud university medical center, PO Box 9101, 6500HB, Nijmegen, the Netherlands; PALGA, Randhoeve 225a, 3995 GA, Houten, the Netherlands. Electronic address: bert.siebers@radboudumc.nl. |
| Source: | European journal of cancer (Oxford, England : 1990) [Eur J Cancer] 2020 Jan; Vol. 124, pp. 102-109. Date of Electronic Publication: 2019 Nov 21. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: Elsevier Science Ltd Country of Publication: England NLM ID: 9005373 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1879-0852 (Electronic) Linking ISSN: 09598049 NLM ISO Abbreviation: Eur J Cancer Subsets: MEDLINE |
| Database: | MEDLINE Ultimate |
Be the first to leave a comment!