| Authors: |
Faruqui N; National Physical Laboratory, Teddington, United Kingdom., Kummrow A; Physikalisch Technische Bundesanstalt, Berlin, Germany., Fu B; National Institute of Metrology, Beijing, China., Divieto C; Istituto Nazionale di Ricerca Metrologica, Turin, Italy., Rojas F; Instituto de Salud Pública de Chile, Santiago, Chile., Kisulu F; Kenya Bureau of Standards, Mombasa, Kenya., Cavalcante JJV; National Institute of Metrology, Quality and Technology (INMETRO), Rio de Janeiro, Brazil., Wang J; National Institute of Metrology, Beijing, China., Campbell J; National Measurement Laboratory at LGC, Teddington, United Kingdom., Martins JL; National Institute of Metrology, Quality and Technology (INMETRO), Rio de Janeiro, Brazil., Choi JH; Korea Research Institute of Standards and Science, Daejeon, South Korea., Sassi MP; Istituto Nazionale di Ricerca Metrologica, Turin, Italy., Zucco M; Istituto Nazionale di Ricerca Metrologica, Turin, Italy., Vonsky M; D. I. Mendeleyev Institute for Metrology, Saint Petersburg, Russia.; Institute of Cytology, Russian Academy of Sciences, Saint Petersburg, Russia., Vessillier S; National Institute for Biological Standards and Control, Potters Bar, United Kingdom., Zou S; Metrology Research Centre, National Research Council, Ottawa, ON, Canada., Fujii SI; National Metrology Institute of Japan, Tsukuba, Japan., Ryadnov MG; National Physical Laboratory, Teddington, United Kingdom. |
