APA (7th ed.) Citation

V, D. P., A, P., M, P., G, T., D, C., & M, F. (2023). Plasma-Assisted Atomic Layer Deposition of IrO2 for Neuroelectronics. Nanomaterials (Basel, Switzerland), 13(6), . https://doi.org/10.3390/nano13060976

Chicago Style (17th ed.) Citation

V, Di Palma, Pianalto A, Perego M, Tallarida G, Codegoni D, and Fanciulli M. "Plasma-Assisted Atomic Layer Deposition of IrO2 for Neuroelectronics." Nanomaterials (Basel, Switzerland) 13, no. 6 (2023). https://doi.org/10.3390/nano13060976.

MLA (9th ed.) Citation

V, Di Palma, et al. "Plasma-Assisted Atomic Layer Deposition of IrO2 for Neuroelectronics." Nanomaterials (Basel, Switzerland), vol. 13, no. 6, 2023, https://doi.org/10.3390/nano13060976.