Tailoring Bi2Se3 Topological Insulator for Visible-NIR Photodetectors with Schottky Contacts Using Liquid Phase Exfoliation.
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| Title: | Tailoring Bi |
|---|---|
| Authors: | Noureen S; School of Science, Minzu University of China, Beijing 100081, China.; Optoelectronic Research Laboratory (OERL), Department of Physics, COMSATS University Islamabad, Park Road, Chak Shahzad, Islamabad 45550, Pakistan., Rehman SU; School of Science, Minzu University of China, Beijing 100081, China., Batool SM; Electric Material and Nanotechnology Lab, North Dakota State University, Fargo, North Dakota 58102, United States., Ali J; Optoelectronic Research Laboratory (OERL), Department of Physics, COMSATS University Islamabad, Park Road, Chak Shahzad, Islamabad 45550, Pakistan., Zhang Q; Electric Material and Nanotechnology Lab, North Dakota State University, Fargo, North Dakota 58102, United States., Batool SS; School of Science, Minzu University of China, Beijing 100081, China.; Optoelectronic Research Laboratory (OERL), Department of Physics, COMSATS University Islamabad, Park Road, Chak Shahzad, Islamabad 45550, Pakistan., Wang Y; School of Science, Minzu University of China, Beijing 100081, China.; Optoelectronics Research Center, Minzu University of China, Beijing 100081, China., Li C; School of Science, Minzu University of China, Beijing 100081, China.; Optoelectronics Research Center, Minzu University of China, Beijing 100081, China. |
| Source: | ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2024 Feb 14; Vol. 16 (6), pp. 8158-8168. Date of Electronic Publication: 2024 Feb 01. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
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