LC, C., & SE, L. (2024). Water Vapor-Impermeable AlON/HfOx Bilayer Films Deposited by Hybrid High-Power Impulse Magnetron Sputtering/Radio-Frequency Magnetron Sputtering Processes. Materials (Basel, Switzerland), 17(22), . https://doi.org/10.3390/ma17225453
Chicago Style (17th ed.) CitationLC, Chang, and Lin SE. "Water Vapor-Impermeable AlON/HfOx Bilayer Films Deposited by Hybrid High-Power Impulse Magnetron Sputtering/Radio-Frequency Magnetron Sputtering Processes." Materials (Basel, Switzerland) 17, no. 22 (2024). https://doi.org/10.3390/ma17225453.
MLA (9th ed.) CitationLC, Chang, and Lin SE. "Water Vapor-Impermeable AlON/HfOx Bilayer Films Deposited by Hybrid High-Power Impulse Magnetron Sputtering/Radio-Frequency Magnetron Sputtering Processes." Materials (Basel, Switzerland), vol. 17, no. 22, 2024, https://doi.org/10.3390/ma17225453.