Water Vapor-Impermeable AlON/HfOx Bilayer Films Deposited by Hybrid High-Power Impulse Magnetron Sputtering/Radio-Frequency Magnetron Sputtering Processes.
Saved in:
| Title: | Water Vapor-Impermeable AlON/HfO |
|---|---|
| Authors: | Chang LC; Department of Materials Engineering, Ming Chi University of Technology, New Taipei City 24301, Taiwan.; Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei City 24301, Taiwan., Lin SE; Department of Materials Engineering, Ming Chi University of Technology, New Taipei City 24301, Taiwan. |
| Source: | Materials (Basel, Switzerland) [Materials (Basel)] 2024 Nov 08; Vol. 17 (22). Date of Electronic Publication: 2024 Nov 08. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: MDPI Country of Publication: Switzerland NLM ID: 101555929 Publication Model: Electronic Cited Medium: Print ISSN: 1996-1944 (Print) Linking ISSN: 19961944 NLM ISO Abbreviation: Materials (Basel) Subsets: PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
|
Full text is not displayed to guests.
Login for full access.
|
|
| ISSN: | 1996-1944 |
|---|---|
| DOI: | 10.3390/ma17225453 |
