APA (7th ed.) Citation

MJ, K., SW, B., JS, H., SH, Y., CH, C., SW, C., . . . JK, J. (2025). Growth of Highly-Ordered-Crystalline Indium-Gallium-Oxide Thin-Film via Plasma-Enhanced ALD for High Performance Top-Gate Field-Effect Transistors. Small methods, 9(7), e2402070. https://doi.org/10.1002/smtd.202402070

Chicago Style (17th ed.) Citation

MJ, Kim, et al. "Growth of Highly-Ordered-Crystalline Indium-Gallium-Oxide Thin-Film via Plasma-Enhanced ALD for High Performance Top-Gate Field-Effect Transistors." Small Methods 9, no. 7 (2025): e2402070. https://doi.org/10.1002/smtd.202402070.

MLA (9th ed.) Citation

MJ, Kim, et al. "Growth of Highly-Ordered-Crystalline Indium-Gallium-Oxide Thin-Film via Plasma-Enhanced ALD for High Performance Top-Gate Field-Effect Transistors." Small Methods, vol. 9, no. 7, 2025, p. e2402070, https://doi.org/10.1002/smtd.202402070.