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Growth of Highly-Ordered-Crystalline Indium-Gallium-Oxide Thin-Film via Plasma-Enhanced ALD for High Performance Top-Gate Field-Effect Transistors.

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Title: Growth of Highly-Ordered-Crystalline Indium-Gallium-Oxide Thin-Film via Plasma-Enhanced ALD for High Performance Top-Gate Field-Effect Transistors.
Authors: Kim MJ; Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea., Bang SW; Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea., Hur JS; Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea., Yoon SH; Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea., Choi CH; Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea., Chung SW; Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea., Oh JE; Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea., Kim Y; Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea., Park BJ; Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea., Lee J; Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea., Yang H; Department of Chemical Engineering, Inha University, Incheon, 22212, Republic of Korea., Ha D; Semiconductor R&D Center, Samsung Electronics, Hwaseong, Gyeonggi-do, 18848, Republic of Korea., Cho MH; Semiconductor R&D Center, Samsung Electronics, Hwaseong, Gyeonggi-do, 18848, Republic of Korea., Jeong JK; Department of Electronic Engineering, Hanyang University, Seoul, 04763, Republic of Korea.
Source: Small methods [Small Methods] 2025 Jul; Vol. 9 (7), pp. e2402070. Date of Electronic Publication: 2024 Dec 30.
Publication Type: Journal Article
Journal Info: Publisher: WILEY-VCH Verlag GmbH & Co. KGaA Country of Publication: Germany NLM ID: 101724536 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 2366-9608 (Electronic) Linking ISSN: 23669608 NLM ISO Abbreviation: Small Methods Subsets: MEDLINE; PubMed not MEDLINE
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  Data: <searchLink fieldCode="JN" term="%22101724536%22">Small methods</searchLink> [Small Methods] 2025 Jul; Vol. 9 (7), pp. e2402070. <i>Date of Electronic Publication: </i>2024 Dec 30.
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