Growth of Highly-Ordered-Crystalline Indium-Gallium-Oxide Thin-Film via Plasma-Enhanced ALD for High Performance Top-Gate Field-Effect Transistors. - Kim MJ; Bang SW; Hur JS; Yoon SH; Choi CH; Chung SW; Oh JE; Kim Y; Park BJ; Lee J; Yang H; Ha D; et al. (Small methods, 2025)