AL, N., A, S., N, S., N, Z., & E, K. (2025). Investigations on the dissolution behavior of silicon in aqueous HF-HClO4-mixtures. RSC advances, 15(20), 15796. https://doi.org/10.1039/d5ra00859j
Chicago Style (17th ed.) CitationAL, Neumann, Stapf A, Schubert N, Zomack N, and Kroke E. "Investigations on the Dissolution Behavior of Silicon in Aqueous HF-HClO4-mixtures." RSC Advances 15, no. 20 (2025): 15796. https://doi.org/10.1039/d5ra00859j.
MLA (9th ed.) CitationAL, Neumann, et al. "Investigations on the Dissolution Behavior of Silicon in Aqueous HF-HClO4-mixtures." RSC Advances, vol. 15, no. 20, 2025, p. 15796, https://doi.org/10.1039/d5ra00859j.
Warning: These citations may not always be 100% accurate.