222 nm far-UVC light and skin health: Assessment of DNA damage across different skin types.

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Title: 222 nm far-UVC light and skin health: Assessment of DNA damage across different skin types.
Authors: Buonanno M; Center for Radiological Research, Columbia University Irving Medical Center, New York, New York, USA., Petersen C; Center for Radiological Research, Columbia University Irving Medical Center, New York, New York, USA., Welch D; Center for Radiological Research, Columbia University Irving Medical Center, New York, New York, USA., Hashmi R; Center for Radiological Research, Columbia University Irving Medical Center, New York, New York, USA., Brenner DJ; Center for Radiological Research, Columbia University Irving Medical Center, New York, New York, USA.
Source: Photochemistry and photobiology [Photochem Photobiol] 2026 Mar-Apr; Vol. 102 (2), pp. 400-410. Date of Electronic Publication: 2025 Jul 09.
Publication Type: Journal Article
Journal Info: Publisher: American Society for Photobiology Country of Publication: United States NLM ID: 0376425 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1751-1097 (Electronic) Linking ISSN: 00318655 NLM ISO Abbreviation: Photochem Photobiol Subsets: MEDLINE
Database: MEDLINE Ultimate
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  Data: <searchLink fieldCode="JN" term="%220376425%22">Photochemistry and photobiology</searchLink> [Photochem Photobiol] 2026 Mar-Apr; Vol. 102 (2), pp. 400-410. <i>Date of Electronic Publication: </i>2025 Jul 09.
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  Data: <i>Publisher: </i><searchLink fieldCode="PB" term="%22American+Society+for+Photobiology%22">American Society for Photobiology </searchLink><i>Country of Publication: </i>United States <i>NLM ID: </i>0376425 <i>Publication Model: </i>Print-Electronic <i>Cited Medium: </i>Internet <i>ISSN: </i>1751-1097 (Electronic) <i>Linking ISSN: </i><searchLink fieldCode="IS" term="%2200318655%22">00318655 </searchLink><i>NLM ISO Abbreviation: </i>Photochem Photobiol <i>Subsets: </i>MEDLINE
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        Value: 10.1111/php.70010
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              Text: 2026 Mar-Apr
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