APA (7th ed.) Citation

TS, T., L, R., H, F., M, T., T, R., DJ, S., . . . MR, L. (2025). Potential-Controlled Deposition of Multilayer CO2 Reduction Catalyst Films onto Silicon Photoelectrodes Demonstrates Thickness-Dependent Catalytic Rates. ACS applied materials & interfaces, 17(45), 62044. https://doi.org/10.1021/acsami.5c15759

Chicago Style (17th ed.) Citation

TS, Teitsworth, et al. "Potential-Controlled Deposition of Multilayer CO2 Reduction Catalyst Films onto Silicon Photoelectrodes Demonstrates Thickness-Dependent Catalytic Rates." ACS Applied Materials & Interfaces 17, no. 45 (2025): 62044. https://doi.org/10.1021/acsami.5c15759.

MLA (9th ed.) Citation

TS, Teitsworth, et al. "Potential-Controlled Deposition of Multilayer CO2 Reduction Catalyst Films onto Silicon Photoelectrodes Demonstrates Thickness-Dependent Catalytic Rates." ACS Applied Materials & Interfaces, vol. 17, no. 45, 2025, p. 62044, https://doi.org/10.1021/acsami.5c15759.