Potential-Controlled Deposition of Multilayer CO2 Reduction Catalyst Films onto Silicon Photoelectrodes Demonstrates Thickness-Dependent Catalytic Rates.
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| Title: | Potential-Controlled Deposition of Multilayer CO |
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| Authors: | Teitsworth TS; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.; Department of Chemistry, Vassar College, Poughkeepsie, New York 12604, United States., Rotundo L; Chemistry Division, Brookhaven National Laboratory, Upton, New York 11973-5000, United States., Fang H; Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States., Tanwar M; Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States., Robinson T; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Siegel DJ; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Powers RE; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Orr AD; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Harvey AK; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Sampaio RN; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Donley CL; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Atkin JM; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Dempsey JL; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Fakhraai Z; Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States., Manbeck GF; Chemistry Division, Brookhaven National Laboratory, Upton, New York 11973-5000, United States., Tereniak SJ; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States., Lockett MR; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States. |
| Source: | ACS applied materials & interfaces [ACS Appl Mater Interfaces] 2025 Nov 12; Vol. 17 (45), pp. 62044-62052. Date of Electronic Publication: 2025 Nov 03. |
| Publication Type: | Journal Article |
| Journal Info: | Publisher: American Chemical Society Country of Publication: United States NLM ID: 101504991 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1944-8252 (Electronic) Linking ISSN: 19448244 NLM ISO Abbreviation: ACS Appl Mater Interfaces Subsets: MEDLINE; PubMed not MEDLINE |
| Database: | MEDLINE Ultimate |
| FullText | Text: Availability: 0 |
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| Header | DbId: mdl DbLabel: MEDLINE Ultimate An: 41178839 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Potential-Controlled Deposition of Multilayer CO<subscript>2</subscript> Reduction Catalyst Films onto Silicon Photoelectrodes Demonstrates Thickness-Dependent Catalytic Rates. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Teitsworth+TS%22">Teitsworth TS</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.; Department of Chemistry, Vassar College, Poughkeepsie, New York 12604, United States.<br /><searchLink fieldCode="AU" term="%22Rotundo+L%22">Rotundo L</searchLink>; Chemistry Division, Brookhaven National Laboratory, Upton, New York 11973-5000, United States.<br /><searchLink fieldCode="AU" term="%22Fang+H%22">Fang H</searchLink>; Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.<br /><searchLink fieldCode="AU" term="%22Tanwar+M%22">Tanwar M</searchLink>; Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.<br /><searchLink fieldCode="AU" term="%22Robinson+T%22">Robinson T</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.<br /><searchLink fieldCode="AU" term="%22Siegel+DJ%22">Siegel DJ</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.<br /><searchLink fieldCode="AU" term="%22Powers+RE%22">Powers RE</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.<br /><searchLink fieldCode="AU" term="%22Orr+AD%22">Orr AD</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.<br /><searchLink fieldCode="AU" term="%22Harvey+AK%22">Harvey AK</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.<br /><searchLink fieldCode="AU" term="%22Sampaio+RN%22">Sampaio RN</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.<br /><searchLink fieldCode="AU" term="%22Donley+CL%22">Donley CL</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.<br /><searchLink fieldCode="AU" term="%22Atkin+JM%22">Atkin JM</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.<br /><searchLink fieldCode="AU" term="%22Dempsey+JL%22">Dempsey JL</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.<br /><searchLink fieldCode="AU" term="%22Fakhraai+Z%22">Fakhraai Z</searchLink>; Department of Chemistry, University of Pennsylvania, Philadelphia, Pennsylvania 19104, United States.<br /><searchLink fieldCode="AU" term="%22Manbeck+GF%22">Manbeck GF</searchLink>; Chemistry Division, Brookhaven National Laboratory, Upton, New York 11973-5000, United States.<br /><searchLink fieldCode="AU" term="%22Tereniak+SJ%22">Tereniak SJ</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States.<br /><searchLink fieldCode="AU" term="%22Lockett+MR%22">Lockett MR</searchLink>; Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, North Carolina 27599-3290, United States. – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22101504991%22">ACS applied materials & interfaces</searchLink> [ACS Appl Mater Interfaces] 2025 Nov 12; Vol. 17 (45), pp. 62044-62052. <i>Date of Electronic Publication: </i>2025 Nov 03. – Name: TypePub Label: Publication Type Group: TypPub Data: Journal Article – Name: TitleSource Label: Journal Info Group: Src Data: <i>Publisher: </i><searchLink fieldCode="PB" term="%22American+Chemical+Society%22">American Chemical Society </searchLink><i>Country of Publication: </i>United States <i>NLM ID: </i>101504991 <i>Publication Model: </i>Print-Electronic <i>Cited Medium: </i>Internet <i>ISSN: </i>1944-8252 (Electronic) <i>Linking ISSN: </i><searchLink fieldCode="IS" term="%2219448244%22">19448244 </searchLink><i>NLM ISO Abbreviation: </i>ACS Appl Mater Interfaces <i>Subsets: </i>MEDLINE; PubMed not MEDLINE |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=mdl&AN=41178839 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1021/acsami.5c15759 Languages: – Code: eng Text: English PhysicalDescription: Pagination: StartPage: 62044 Titles: – TitleFull: Potential-Controlled Deposition of Multilayer CO2 Reduction Catalyst Films onto Silicon Photoelectrodes Demonstrates Thickness-Dependent Catalytic Rates. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Teitsworth TS – PersonEntity: Name: NameFull: Rotundo L – PersonEntity: Name: NameFull: Fang H – PersonEntity: Name: NameFull: Tanwar M – PersonEntity: Name: NameFull: Robinson T – PersonEntity: Name: NameFull: Siegel DJ – PersonEntity: Name: NameFull: Powers RE – PersonEntity: Name: NameFull: Orr AD – PersonEntity: Name: NameFull: Harvey AK – PersonEntity: Name: NameFull: Sampaio RN – PersonEntity: Name: NameFull: Donley CL – PersonEntity: Name: NameFull: Atkin JM – PersonEntity: Name: NameFull: Dempsey JL – PersonEntity: Name: NameFull: Fakhraai Z – PersonEntity: Name: NameFull: Manbeck GF – PersonEntity: Name: NameFull: Tereniak SJ – PersonEntity: Name: NameFull: Lockett MR IsPartOfRelationships: – BibEntity: Dates: – D: 12 M: 11 Text: 2025 Nov 12 Type: published Y: 2025 Identifiers: – Type: issn-electronic Value: 1944-8252 Numbering: – Type: volume Value: 17 – Type: issue Value: 45 Titles: – TitleFull: ACS applied materials & interfaces Type: main |
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