APA (7th ed.) Citation

T, P., Q, W., X, A., M, J., JS, G., E, D., . . . B, S. (2026). Bis(2-amino-5-thienyl)Ketone as Oxygen Tolerant Sensitizer for Conventional Radical Photopolymerization. Angewandte Chemie (International ed. in English), 65(5), e18608. https://doi.org/10.1002/anie.202518608

Chicago Style (17th ed.) Citation

T, Poplata, Wang Q, Allonas X, Jäger M, Gutmann JS, Dmitrieva E, Hartmann H, and Strehmel B. "Bis(2-amino-5-thienyl)Ketone as Oxygen Tolerant Sensitizer for Conventional Radical Photopolymerization." Angewandte Chemie (International Ed. in English) 65, no. 5 (2026): e18608. https://doi.org/10.1002/anie.202518608.

MLA (9th ed.) Citation

T, Poplata, et al. "Bis(2-amino-5-thienyl)Ketone as Oxygen Tolerant Sensitizer for Conventional Radical Photopolymerization." Angewandte Chemie (International Ed. in English), vol. 65, no. 5, 2026, p. e18608, https://doi.org/10.1002/anie.202518608.