APA (7th ed.) Citation

Huang, S., & Wu, K. (2019). Health Risk Assessment of Photoresists Used in an Optoelectronic Semiconductor Factory. Risk Analysis: An International Journal, 39(12), 2625. https://doi.org/10.1111/risa.13366

Chicago Style (17th ed.) Citation

Huang, Shao‐Zu, and Kuen‐Yuh Wu. "Health Risk Assessment of Photoresists Used in an Optoelectronic Semiconductor Factory." Risk Analysis: An International Journal 39, no. 12 (2019): 2625. https://doi.org/10.1111/risa.13366.

MLA (9th ed.) Citation

Huang, Shao‐Zu, and Kuen‐Yuh Wu. "Health Risk Assessment of Photoresists Used in an Optoelectronic Semiconductor Factory." Risk Analysis: An International Journal, vol. 39, no. 12, 2019, p. 2625, https://doi.org/10.1111/risa.13366.