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Barrierless Cu–Ni–Nb thin films on silicon with high thermal stability and low electrical resistivity– ERRATUM.

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Bibliographic Details
Title: Barrierless Cu–Ni–Nb thin films on silicon with high thermal stability and low electrical resistivity– ERRATUM.
Authors: Li, Xiao Na, Zhao, Li Rong, Li, Zhen, Liu, Li Jun, Bao, Cui Min, Chu, Jinn P., Dong, Chuang
Source: Journal of Materials Research; Feb2014, Vol. 29 Issue 4, p605-605, 1p
Database: Applied Science & Technology Source
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