X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via.
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| Title: | X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via. |
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| Authors: | Todt, J.1, Hammer, H.2, Sartory, B.2, Burghammer, M.3, Kraft, J.4, Daniel, R.5, Keckes, J.1, Defregger, S.2 |
| Source: | Journal of Applied Crystallography; Feb2016, Vol. 49 Issue 1, p182-187, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218898 |
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| DOI: | 10.1107/S1600576715023419 |
