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X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via.

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Title: X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via.
Authors: Todt, J.1, Hammer, H.2, Sartory, B.2, Burghammer, M.3, Kraft, J.4, Daniel, R.5, Keckes, J.1, Defregger, S.2
Source: Journal of Applied Crystallography; Feb2016, Vol. 49 Issue 1, p182-187, 5p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 112650943
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1107/S1600576715023419
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      – Code: eng
        Text: English
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      Pagination:
        PageCount: 5
        StartPage: 182
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      – TitleFull: X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via.
        Type: main
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          Name:
            NameFull: Todt, J.
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            NameFull: Hammer, H.
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            NameFull: Sartory, B.
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            NameFull: Burghammer, M.
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            NameFull: Kraft, J.
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            NameFull: Daniel, R.
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            NameFull: Keckes, J.
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            – D: 01
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              Text: Feb2016
              Type: published
              Y: 2016
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              Value: 49
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            – TitleFull: Journal of Applied Crystallography
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