Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor.
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| Title: | Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor. |
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| Authors: | Li, D.1, dyli@yzu.edu.cn, Goullet, A.2, Carette, M.3, Granier, A.2, Zhang, Y.1, Landesman, J.P.4 |
| Source: | Vacuum; Sep2016, Vol. 131, p231-239, 9p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 117010721 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Li%2C+D%2E%22">Li, D.</searchLink><relatesTo>1</relatesTo>, <i>dyli@yzu.edu.cn</i><br /><searchLink fieldCode="AU" term="%22Goullet%2C+A%2E%22">Goullet, A.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Carette%2C+M%2E%22">Carette, M.</searchLink><relatesTo>3</relatesTo><br /><searchLink fieldCode="AU" term="%22Granier%2C+A%2E%22">Granier, A.</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Zhang%2C+Y%2E%22">Zhang, Y.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Landesman%2C+J%2EP%2E%22">Landesman, J.P.</searchLink><relatesTo>4</relatesTo> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Vacuum%22">Vacuum</searchLink>; Sep2016, Vol. 131, p231-239, 9p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=117010721 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1016/j.vacuum.2016.07.004 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 9 StartPage: 231 Titles: – TitleFull: Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Li, D. – PersonEntity: Name: NameFull: Goullet, A. – PersonEntity: Name: NameFull: Carette, M. – PersonEntity: Name: NameFull: Granier, A. – PersonEntity: Name: NameFull: Zhang, Y. – PersonEntity: Name: NameFull: Landesman, J.P. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 09 Text: Sep2016 Type: published Y: 2016 Identifiers: – Type: issn-print Value: 0042207X Numbering: – Type: volume Value: 131 Titles: – TitleFull: Vacuum Type: main |
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