Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor.

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Title: Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor.
Authors: Li, D.1, dyli@yzu.edu.cn, Goullet, A.2, Carette, M.3, Granier, A.2, Zhang, Y.1, Landesman, J.P.4
Source: Vacuum; Sep2016, Vol. 131, p231-239, 9p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 117010721
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor.
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  Data: <searchLink fieldCode="JN" term="%22Vacuum%22">Vacuum</searchLink>; Sep2016, Vol. 131, p231-239, 9p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=117010721
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      – Type: doi
        Value: 10.1016/j.vacuum.2016.07.004
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      – Code: eng
        Text: English
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      – TitleFull: Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor.
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              Text: Sep2016
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