Single-step inductively coupled plasma etching of sputtered Nb2O5/SiO2 multilayer stacks using chromium etch mask.
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| Title: | Single-step inductively coupled plasma etching of sputtered Nb2O5/SiO2 multilayer stacks using chromium etch mask. |
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| Authors: | Taimoor, Muhammad1, taimoor@ina.uni-kassel.de, Alatawi, Abdullah1, Reuter, Sabrina1, Hillmer, Hartmut1, Kusserow, Thomas1 |
| Source: | Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul2017, Vol. 35 Issue 4, p1-5, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 07342101 |
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| DOI: | 10.1116/1.4983683 |
