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Single-step inductively coupled plasma etching of sputtered Nb2O5/SiO2 multilayer stacks using chromium etch mask.

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Title: Single-step inductively coupled plasma etching of sputtered Nb2O5/SiO2 multilayer stacks using chromium etch mask.
Authors: Taimoor, Muhammad1, taimoor@ina.uni-kassel.de, Alatawi, Abdullah1, Reuter, Sabrina1, Hillmer, Hartmut1, Kusserow, Thomas1
Source: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Jul2017, Vol. 35 Issue 4, p1-5, 5p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 124036259
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Single-step inductively coupled plasma etching of sputtered Nb2O5/SiO2 multilayer stacks using chromium etch mask.
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  Data: <searchLink fieldCode="AU" term="%22Taimoor%2C+Muhammad%22">Taimoor, Muhammad</searchLink><relatesTo>1</relatesTo>, <i>taimoor@ina.uni-kassel.de</i><br /><searchLink fieldCode="AU" term="%22Alatawi%2C+Abdullah%22">Alatawi, Abdullah</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Reuter%2C+Sabrina%22">Reuter, Sabrina</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Hillmer%2C+Hartmut%22">Hillmer, Hartmut</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Kusserow%2C+Thomas%22">Kusserow, Thomas</searchLink><relatesTo>1</relatesTo>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Vacuum+Science+%26+Technology%3A+Part+A-Vacuums%2C+Surfaces+%26+Films%22">Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films</searchLink>; Jul2017, Vol. 35 Issue 4, p1-5, 5p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=124036259
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1116/1.4983683
    Languages:
      – Code: eng
        Text: English
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      Pagination:
        PageCount: 5
        StartPage: 1
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      – TitleFull: Single-step inductively coupled plasma etching of sputtered Nb2O5/SiO2 multilayer stacks using chromium etch mask.
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            NameFull: Taimoor, Muhammad
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            NameFull: Alatawi, Abdullah
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            NameFull: Reuter, Sabrina
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            NameFull: Hillmer, Hartmut
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            – D: 01
              M: 07
              Text: Jul2017
              Type: published
              Y: 2017
          Identifiers:
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              Value: 07342101
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              Value: 35
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              Value: 4
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            – TitleFull: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
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