APA (7th ed.) Citation

Yang, C. R., Yeh, C. H., Hu, L. C., Wei, T. C., Lee, C. C., Chang, J. Y., & Li, T. T. (2018). Magnetic Field Resonance and Pressure Effects on Epitaxial Thin Film Deposition and In Situ Plasma Diagnostics. Plasma Chemistry & Plasma Processing, 38(1), 247. https://doi.org/10.1007/s11090-017-9853-3

Chicago Style (17th ed.) Citation

Yang, C. R., C. H. Yeh, L. C. Hu, T. C. Wei, C. C. Lee, J. Y. Chang, and T. T. Li. "Magnetic Field Resonance and Pressure Effects on Epitaxial Thin Film Deposition and In Situ Plasma Diagnostics." Plasma Chemistry & Plasma Processing 38, no. 1 (2018): 247. https://doi.org/10.1007/s11090-017-9853-3.

MLA (9th ed.) Citation

Yang, C. R., et al. "Magnetic Field Resonance and Pressure Effects on Epitaxial Thin Film Deposition and In Situ Plasma Diagnostics." Plasma Chemistry & Plasma Processing, vol. 38, no. 1, 2018, p. 247, https://doi.org/10.1007/s11090-017-9853-3.