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THE IMPACT OF SUBSTRATE DOPING CONCENTRATION ON ELECTRICAL CHARACTERISTICS OF 45NM NMOS DEVICE.

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Bibliographic Details
Title: THE IMPACT OF SUBSTRATE DOPING CONCENTRATION ON ELECTRICAL CHARACTERISTICS OF 45NM NMOS DEVICE.
Authors: SACHDEVA, NITIN1, VASHISHATH, MUNISH2, BANSAL, P. K.3
Source: i-Manager's Journal on Electronics Engineering; Dec2017-Feb2018, Vol. 8 Issue 2, p20-26, 7p
Database: Applied Science & Technology Source
Description
ISSN:22297286