Annealing and biasing effects on the structural and optical properties of PECVD-grown TiO2 films from TTIP/O2 plasma.

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Title: Annealing and biasing effects on the structural and optical properties of PECVD-grown TiO2 films from TTIP/O2 plasma.
Authors: Li, D.1, dyli@yzu.edu.cn, Dai, S.1, Goullet, A.2, Carette, M.3, Granier, A.2, Landesman, J. P.4
Source: Journal of Materials Science: Materials in Electronics; Aug2018, Vol. 29 Issue 15, p13254-13264, 11p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
An: 130694891
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  Data: Annealing and biasing effects on the structural and optical properties of PECVD-grown TiO2 films from TTIP/O2 plasma.
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Materials+Science%3A+Materials+in+Electronics%22">Journal of Materials Science: Materials in Electronics</searchLink>; Aug2018, Vol. 29 Issue 15, p13254-13264, 11p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=130694891
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      – Type: doi
        Value: 10.1007/s10854-018-9449-6
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      – Code: eng
        Text: English
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        PageCount: 11
        StartPage: 13254
    Titles:
      – TitleFull: Annealing and biasing effects on the structural and optical properties of PECVD-grown TiO2 films from TTIP/O2 plasma.
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            NameFull: Li, D.
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            NameFull: Dai, S.
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            NameFull: Goullet, A.
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            NameFull: Carette, M.
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            NameFull: Granier, A.
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            NameFull: Landesman, J. P.
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            – D: 01
              M: 08
              Text: Aug2018
              Type: published
              Y: 2018
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              Value: 29
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            – TitleFull: Journal of Materials Science: Materials in Electronics
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