Effect of O2 flow rate on the characteristics of ZnO thin films deposited by RF reactive magnetron sputtering.

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Bibliographic Details
Title: Effect of O2 flow rate on the characteristics of ZnO thin films deposited by RF reactive magnetron sputtering.
Authors: Kamble, Sudhir S.1, sudhirsk@debel.drdo.in, Radhakrishnan, J. K.1, Krishnamoorthy, Rajavel2
Source: Materials Technology; Sep2018, Vol. 33 Issue 11, p709-715, 7p
Database: Applied Science & Technology Source
Description
ISSN:10667857
DOI:10.1080/10667857.2018.1497834