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Effect of O2 flow rate on the characteristics of ZnO thin films deposited by RF reactive magnetron sputtering.

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Title: Effect of O2 flow rate on the characteristics of ZnO thin films deposited by RF reactive magnetron sputtering.
Authors: Kamble, Sudhir S.1, sudhirsk@debel.drdo.in, Radhakrishnan, J. K.1, Krishnamoorthy, Rajavel2
Source: Materials Technology; Sep2018, Vol. 33 Issue 11, p709-715, 7p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 131980541
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: Effect of O2 flow rate on the characteristics of ZnO thin films deposited by RF reactive magnetron sputtering.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AU" term="%22Kamble%2C+Sudhir+S%2E%22">Kamble, Sudhir S.</searchLink><relatesTo>1</relatesTo>, <i>sudhirsk@debel.drdo.in</i><br /><searchLink fieldCode="AU" term="%22Radhakrishnan%2C+J%2E+K%2E%22">Radhakrishnan, J. K.</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Krishnamoorthy%2C+Rajavel%22">Krishnamoorthy, Rajavel</searchLink><relatesTo>2</relatesTo>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Materials+Technology%22">Materials Technology</searchLink>; Sep2018, Vol. 33 Issue 11, p709-715, 7p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=131980541
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1080/10667857.2018.1497834
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 7
        StartPage: 709
    Titles:
      – TitleFull: Effect of O2 flow rate on the characteristics of ZnO thin films deposited by RF reactive magnetron sputtering.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Kamble, Sudhir S.
      – PersonEntity:
          Name:
            NameFull: Radhakrishnan, J. K.
      – PersonEntity:
          Name:
            NameFull: Krishnamoorthy, Rajavel
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 15
              M: 09
              Text: Sep2018
              Type: published
              Y: 2018
          Identifiers:
            – Type: issn-print
              Value: 10667857
          Numbering:
            – Type: volume
              Value: 33
            – Type: issue
              Value: 11
          Titles:
            – TitleFull: Materials Technology
              Type: main
ResultId 1