Etching of glass, silicon, and silicon dioxide using negative ionic liquid ion sources.
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| Title: | Etching of glass, silicon, and silicon dioxide using negative ionic liquid ion sources. |
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| Authors: | Xu, Tiantong1, Tao, Zhi1, Lozano, Paulo C.2, plozano@mit.edu |
| Source: | Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Sep2018, Vol. 36 Issue 5, pN.PAG-N.PAG, 13p |
| Database: | Applied Science & Technology Source |
| ISSN: | 21662746 |
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| DOI: | 10.1116/1.5034131 |
