Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition.
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| Title: | Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition. |
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| Authors: | Xu, Yu1, Zhang, Yu2, Li, Linjun2, Ding, Ke1,2, Guo, Ying2, Shi, Jianjun1,2, Huang, Xiaojiang2, Zhang, Jing1, jingzh@dhu.edu.cn |
| Source: | Plasma Chemistry & Plasma Processing; Jul2019, Vol. 39 Issue 4, p937-947, 11p |
| Database: | Applied Science & Technology Source |
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| ISSN: | 02724324 |
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| DOI: | 10.1007/s11090-019-09961-0 |
