APA (7th ed.) Citation

Xu, Y., Zhang, Y., Li, L., Ding, K., Guo, Y., Shi, J., . . . Zhang, J. (2019). Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition. Plasma Chemistry & Plasma Processing, 39(4), 937. https://doi.org/10.1007/s11090-019-09961-0

Chicago Style (17th ed.) Citation

Xu, Yu, Yu Zhang, Linjun Li, Ke Ding, Ying Guo, Jianjun Shi, Xiaojiang Huang, and Jing Zhang. "Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition." Plasma Chemistry & Plasma Processing 39, no. 4 (2019): 937. https://doi.org/10.1007/s11090-019-09961-0.

MLA (9th ed.) Citation

Xu, Yu, et al. "Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition." Plasma Chemistry & Plasma Processing, vol. 39, no. 4, 2019, p. 937, https://doi.org/10.1007/s11090-019-09961-0.