View in EDS HTML Full Text PDF Full Text

Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition.

Saved in:
Bibliographic Details
Title: Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition.
Authors: Xu, Yu1, Zhang, Yu2, Li, Linjun2, Ding, Ke1,2, Guo, Ying2, Shi, Jianjun1,2, Huang, Xiaojiang2, Zhang, Jing1, jingzh@dhu.edu.cn
Source: Plasma Chemistry & Plasma Processing; Jul2019, Vol. 39 Issue 4, p937-947, 11p
Database: Applied Science & Technology Source
Full text is not displayed to guests.
FullText Links:
  – Type: pdflink
Text:
  Availability: 1
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 136800449
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
Items – Name: Title
  Label: Title
  Group: Ti
  Data: Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AU" term="%22Xu%2C+Yu%22">Xu, Yu</searchLink><relatesTo>1</relatesTo><br /><searchLink fieldCode="AU" term="%22Zhang%2C+Yu%22">Zhang, Yu</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Li%2C+Linjun%22">Li, Linjun</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Ding%2C+Ke%22">Ding, Ke</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Guo%2C+Ying%22">Guo, Ying</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Shi%2C+Jianjun%22">Shi, Jianjun</searchLink><relatesTo>1,2</relatesTo><br /><searchLink fieldCode="AU" term="%22Huang%2C+Xiaojiang%22">Huang, Xiaojiang</searchLink><relatesTo>2</relatesTo><br /><searchLink fieldCode="AU" term="%22Zhang%2C+Jing%22">Zhang, Jing</searchLink><relatesTo>1</relatesTo>, <i>jingzh@dhu.edu.cn</i>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: <searchLink fieldCode="JN" term="%22Plasma+Chemistry+%26+Plasma+Processing%22">Plasma Chemistry & Plasma Processing</searchLink>; Jul2019, Vol. 39 Issue 4, p937-947, 11p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=136800449
RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.1007/s11090-019-09961-0
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 11
        StartPage: 937
    Titles:
      – TitleFull: Synergistic Effect of Plasma Discharge and Substrate Temperature in Improving the Crystallization of TiO2 Film by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Xu, Yu
      – PersonEntity:
          Name:
            NameFull: Zhang, Yu
      – PersonEntity:
          Name:
            NameFull: Li, Linjun
      – PersonEntity:
          Name:
            NameFull: Ding, Ke
      – PersonEntity:
          Name:
            NameFull: Guo, Ying
      – PersonEntity:
          Name:
            NameFull: Shi, Jianjun
      – PersonEntity:
          Name:
            NameFull: Huang, Xiaojiang
      – PersonEntity:
          Name:
            NameFull: Zhang, Jing
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 07
              Text: Jul2019
              Type: published
              Y: 2019
          Identifiers:
            – Type: issn-print
              Value: 02724324
          Numbering:
            – Type: volume
              Value: 39
            – Type: issue
              Value: 4
          Titles:
            – TitleFull: Plasma Chemistry & Plasma Processing
              Type: main
ResultId 1