APA (7th ed.) Citation

Chia, C., Martis, J., Jeffrey, S. S., & Howe, R. T. (2019). Neural network-based model of photoresist reflow. Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics, 37(6), 1. https://doi.org/10.1116/1.5116857

Chicago Style (17th ed.) Citation

Chia, Charmaine, Joel Martis, Stefanie S. Jeffrey, and Roger T. Howe. "Neural Network-based Model of Photoresist Reflow." Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics 37, no. 6 (2019): 1. https://doi.org/10.1116/1.5116857.

MLA (9th ed.) Citation

Chia, Charmaine, et al. "Neural Network-based Model of Photoresist Reflow." Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics, vol. 37, no. 6, 2019, p. 1, https://doi.org/10.1116/1.5116857.